Low Temperature Plasma Technology: Methods and Applications

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Paul K. Chu, XinPei Lu
CRC Press, 15 lug 2013 - 493 pagine
Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration i
 

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Informazioni sull'autore (2013)

Paul K. Chu is Chair Professor of Materials Engineering in the Department of Physics and Materials Science at the City University of Hong Kong. A fellow of the IEEE, APS, AVS, and HKIE, Dr. Chu is the author of more than 20 book chapters, 900 journal papers, and 800 conference papers and holds numerous patents. He is also the senior editor of IEEE Transactions on Plasma Science, associate editor of Materials Science & Engineering Reports, and an editorial board member of several international journals. His research activities encompass plasma surface engineering and various types of materials and nanotechnology. He received a PhD in chemistry from Cornell University.

XinPei Lu is a professor (ChangJiang Scholar) in the College of Electrical and Electronic Engineering at Huazhong University of Science and Technology. A senior member of IEEE, Dr. Lu is the author or coauthor of 50 peer-reviewed journal articles and holds six patents. His research interests include low-temperature plasma sources and their biomedical applications, modeling of low-temperature plasmas, and plasma diagnostics. He received a PhD in electrical engineering from Huazhong University of Science and Technology.

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